Specialty Gas
C4F6 / Hexafluoro-1,3-butadiene / Electronic gas
Hexafluoro-1,3-butadiene (C4F6) is an environmentally friendly dry etching gas with low GWP, high etching rate, high selectivity and high aspect ratio, showing very high performance for critical plasma etching in semiconductor devices manufacturing.
C4F6 Molecular Structure
· Production Description
· Packaging Information: 4.64L/10.2L/44L Cylinder
| Items | Specification |
| Chemical Name |
Hexafluorocyclobutene Hexafluoro-1,3-butadiene, Perfluorobutadiene |
| Chemical Formula | CF2=CF-CF=CF2 |
| CAS NO. | C4F6 |
| Molecular weight (g/mol) | 685-63-2 |
| ODP | 162.03 |
| GWP100 yr | 0 |
| Atmospheric lifetime (days) | <1 |
| Purity | 1.1 |
| C3H2F4 / HFO-1234ze(Z) | ≥99.0% |
· Typical Physical or Chemical Properties
| Attributes | Values |
| Chemical Name | Hexafluoro-1 3-butadiene, Perfluorobutadiene |
| Boiling point (℃) | -6.5 |
| Freezing point (℃) | -130 |
| Critical temperature (℃) | 139.6 |
| Critical pressure (bar) | 31.9 |
| Liquid density (kg/l, @15℃) | 1.44 |
| Vapor density (kg/m3, @15℃) | 6.8 |
| Vapor pressure (bar, @25℃) | 2.11 |
| Heat of vaporization (kJ/kg，@b.p.) | 161.8 |
| Explosion limits (%vol) | 7-73 |