Specialty Gas
- C4F6
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CH3F
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C3F6
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CF3I
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C3H2F6 HFC-236fa
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- C3H2F6 HFC-236ea
- HFO-1336mzz(E)
- HFO-1234ze(Z)
- C4F7N
- CF4
- other
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C3H2F6 / 1,1,1,3,3,3-Hexafluoropropane / HFC-236fa / Electronic gas
1,1,1,3,3,3-Hexafluoropropane(HFC-236fa) is an environmentally friendly and novel dry etching gas, mainly used in front end etching process of semiconductor.
C3H2F6 Molecular Structure
· Production Description
· Packaging Information: 10.2L Cylinder
| Items | Specification |
| Chemical name | 1,1,1,3,3,3-Hexafluoropropane, HFC-236fa |
| CAS No. | 690-39-1 |
| Molecular formula | C3H2F6 |
| Molecular weight | 152.04 |
| Boiling point (101.325kPa, ℃) | -1.1 |
| Vapor Pressure (25℃, kPa) | 260.8 |
| Density (101.325kPa, g/cm3) | 1.371 |
| Purity | ≥99.0% |