Specialty Gas
- C4F6
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CH3F
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C3F6
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CF3I
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C3H2F6 HFC-236fa
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C3H2F6 HFC-236ea
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- HFO-1336mzz(E)
- HFO-1234ze(Z)
- C4F7N
- CF4
- other
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C3H2F6 / 1,1,1,2,3,3-Hexafluoropropane / HFC-236ea / Electronic gas
1,1,1,3,3,3-Hexafluoropropane(HFC-236fa) is an environmentally friendly and novel dry etching gas, mainly used in front end etching process of semiconductor.
C3H2F6 Molecular Structure
· Production Description
· Packaging Information: 10.2L Cylinder
| Items | Specification |
| Chemical name | 1,1,1,2,3,3-Hexafluoropropane, HFC-236ea |
| CAS No. | 431-63-0 |
| Molecular formula | C3H2F6 |
| Molecular weight | 152.04 |
| Boiling point (101.325kPa, ℃) | 6.19 |
| Vapor Pressure (25℃, kPa) | 139.29 |
| Critical Pressure (MPa) | 3.50198 |
| Purity | ≥99.0% |